3D lithography mask simulation on 3D lithography mask simulation 13.5 nm
3.1Relative L2 ErrorWGNO
Evaluation Results
| Method | Links | |
|---|---|---|
| WGNOInference (s)=2.24 × 10−4, Training time (s)=19.42026.03 | 3.1 |
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| Method | Links | |
|---|---|---|
| WGNOInference (s)=2.24 × 10−4, Training time (s)=19.42026.03 | 3.1 |