ResearchBenchmarks2D lithography mask simulation 11.2 nm wavelength (test)Follow3.3Relative L2 ErrorPINN3.2923.3463.43.454Mar 16, 2026Evaluation ResultsMethodMethodLinksRelative L2 ErrorTraining Time (s)Inference Time (s)PINN2026.033.31,2521.2WGNO2026.033.57.71.8