ResearchBenchmarks2D Lithography Mask Simulation on 13.5 nm Wavelength (test)Follow3.1Relative L2 ErrorPINN3.0723.2613.453.639Mar 16, 2026Evaluation ResultsMethodMethodLinksRelative L2 ErrorTraining Time (s)Inference Time (s)PINN2026.033.11,0031.2WGNO2026.033.84.31.8