ResearchBenchmarks3D lithography mask simulation 11.2 nm3D lithography mask simulation 11.2 nmFollow2.8Rel. L2 ErrorWGNO2.662.732.82.87Mar 16, 2026Evaluation resultsMethodMethodLinksRel. L2 ErrorWGNOInference (s)=2.19 × 1...Inference (s)=2.19 × 10−4, Training time (s)=18.92026.032.8