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3D lithography mask simulation 11.2 nm benchmark leaderboard · SOTA2 Research

Research Benchmarks

3D lithography mask simulation 11.2 nm

2.8Rel. L2 ErrorWGNO

Updated 4mo ago

Evaluation Results

Method	Links
WGNO2026.03		2.8

SOTA Paper

WGNO

Physics-Informed Neural Systems for the Simulation of EUV Electromagnetic Wave Diffraction from a Lithography Mask

Dataset

3D lithography mask simulation

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Related Benchmarks

Electromagnetic Wave Simulation on 2D problems Wave propagation 1.0 (test)Electromagnetic Wave Simulation on 2D Wave Scattering Interface (test)Electromagnetic wave simulation on 2D problems Reflection from layer 1.0 (test)2D Lithography Mask Simulation on 13.5 nm Wavelength (test)2D lithography mask simulation 11.2 nm wavelength (test)