# Effect of Thermal Annealing on Boron Diffusion, Micro-structural, Electrical and Magnetic properties of Laser Ablated CoFeB Thin Films

Source: [Effect of Thermal Annealing on Boron Diffusion, Micro-structural, Electrical and Magnetic properties of Laser Ablated CoFeB Thin Films](<https://www.sota2.com/research/paper/68fa2c831e209131ce85085e>)

Collection index: [llms.txt](<https://www.sota2.com/research/llms.txt>)

Data updated: 2025-10-27T03:21:15.305Z

Authors: G. Venkat Swamy, Himanshu Pandey, A. K. Srivastava, M. K. Dalai, K. K. Maurya, Rashmi, R. K. Rakshit

Published: 2013-05-31T09:21:02.000Z

## Abstract

We report on Boron diffusion and subsequent crystallization of Co$\_{40}$Fe$\_{40}$B$\_{20}$ (CoFeB) thin films on SiO$\_2$/Si(001) substrate using pulsed laser deposition. Secondary ion mass spectroscopy reveals Boron diffusion at the interface in both amorphous and crystalline phase of CoFeB. High-resolution transmission electron microscopy reveals a small fraction of nano-crystallites embedded in the amorphous matrix of CoFeB. However, annealing at 400$^\\circ$C results in crystallization of CoFe with \\textit{bcc} structure along (110) orientation. As-deposited films are non-metallic in nature with the coercivity (H$\_c$) of 5Oe while the films annealed at 400$^\\circ$C are metallic with a H$\_c$ of 135Oe.

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## Original sources and implementation

[Original paper](<https://arxiv.org/abs/1305.7335>)

[PDF](<https://arxiv.org/pdf/1305.7335.pdf>)