samadii/plasma
Particle-based plasma simulation solution combining 3D Particle-In-Cell (PIC) method for particle–electromagnetic field interaction with Monte Carlo Collision (MCC) method for plasma reactions including elastic collision, inelastic collision, and ionization. Simulates plasma processes such as etching, deposition, and sputtering inside chambers with CCP, ICP, and microwave sources using CUDA GPU computing.
What it does
Particle-based plasma simulation solution combining 3D Particle-In-Cell (PIC) method for particle–electromagnetic field interaction with Monte Carlo Collision (MCC) method for plasma reactions including elastic collision, inelastic collision, and ionization. Simulates plasma processes such as etching, deposition, and sputtering inside chambers with CCP, ICP, and microwave sources using CUDA GPU computing.
- Plasma simulation for semiconductor and display panel manufacturing
- CAE engineering simulation using GPU computing
- Category
- Scientific models
- Built for
- Manufacturing and industrial
- Public API
- Not offered
Not yet disclosed: deployment options, platforms, languages and support channels.
Pricing
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Security and compliance
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