Particle-based plasma simulation solution combining 3D Particle-In-Cell (PIC) method for particle–electromagnetic field interaction with Monte Carlo Collision (MCC) method for p...
Particle-based plasma simulation solution combining 3D Particle-In-Cell (PIC) method for particle–electromagnetic field interaction with Monte Carlo Collision (MCC) method for plasma reactions including elastic collision, inelastic collision, and ionization. Simulates plasma processes such as etching, deposition, and sputtering inside chambers with CCP, ICP, and microwave sources using CUDA GPU computing.
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