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TrueMask DS
GPU-accelerated mask-wafer double simulation workstation for 193i and EUV lithography.
What is TrueMask DS?
GPU-accelerated mask-wafer double simulation workstation for 193i and EUV lithography. Supports R&D exploration, bit-cell design, hot-spot analysis, and mask-defect categorization with overlapping shots and dose modulation.
Product typeIndustrial Automation
Pricing ·
Deployment
APINot available
What teams use TrueMask DS for
Inverse lithography technology (ILT) for curvilinear shapes on photomasks
Mask process correction (MPC) for multi-beam mask writing
Curvilinear mask and wafer simulation and verification
Deep learning for photomask and semiconductor manufacturing
Integrations and access
Platforms, integrations, and language support vary by plan and region. Confirm final requirements with the vendor.
Platforms
IntegrationsAPI and webhooks
Languages
Support
What reviewers say
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Enterprise readiness
Compliance claims are normalized from current vendor documentation and independently reviewed by SOTA2.
Data retention:
Benchmarks and comparisons
Independent benchmarksStructured task results are being verified.
Side-by-side comparisonsComparison workspaces will be available in a later release.
