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TrueMask DS

Industrial automation · by D2S

GPU-accelerated mask-wafer double simulation workstation for 193i and EUV lithography.

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What it does

GPU-accelerated mask-wafer double simulation workstation for 193i and EUV lithography. Supports R&D exploration, bit-cell design, hot-spot analysis, and mask-defect categorization with overlapping shots and dose modulation.

  • Inverse lithography technology (ILT) for curvilinear shapes on photomasks
  • Mask process correction (MPC) for multi-beam mask writing
  • Curvilinear mask and wafer simulation and verification
  • Deep learning for photomask and semiconductor manufacturing
Category
Industrial automation
Built for
Manufacturing and industrial
Users
Semiconductor manufacturing leaders, Fabs, Mask shops, Equipment or service suppliers and 1 more
Public API
Not offered

Not yet disclosed: deployment options, platforms, languages and support channels.

Pricing

Pricing isn't published

D2S doesn't list prices publicly. Ask them for a quote.

Security and compliance

No security details published yet

D2S hasn't published certifications or security practices for TrueMask DS that we could find. Ask their team for audit reports.

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